That's it ... the doors to CIM 2017 have closed!
The International Metrology Congress (CIM) is unique in Europe in that it presents all possible technical subjects and brings together all the players involved in measurement: from R&D to industrial users of measurement equipment.
Since 2011, it has been organized in conjunction with Enova, the electronics, embedded, IoT, measurement, vision and optics technologies show.
The 2017 edition confirmed its place with a very balanced mix between exchanges on best practices measured against the daily life of industrialists, and, presentations of a more futuristic nature linked to the mutations of the factory of the future.
The 2017 results show a stable number of participants and superb growth in the exhibition section.
The key figures are as follows:
- 840 participants and exhibitors attended the conference (813 in 2015);
- 45 different countries were represented, and 30 % of the participants came from abroad;
- 78 companies exhibited in the Metrology Village located within the Enova Show (+37 % compared to 2015!);
- The technical level was judged excellent or satisfactory by 93 % of participants;
- application possibilities were excellent or satisfactory in 84 % of cases;
- 192 lectures were presented in oral or poster sessions.
A remarkable opening address by Pascal Faure, Director of the Directorate General for Enterprise at the French Ministry of the Economy and Finance.
Here is an excerpt from that speech: " Today, even more than in the past, metrology, the science and techniques of measurement, are essential factors in the success of a modern, dynamic industrial policy.
Because each and every one of you knows how crucial it is to master measurement throughout the value chain, from R&D in the laboratory to final inspection. We have entered an era of innovation at rates never seen before, and this innovation requires ever more efficient and reliable measurement tools. (...)
As the only place in Europe and the world where metrology issues can be discussed and where the information needed to develop a metrological culture is disseminated, this congress is, in my opinion, a must-attend event.
The top 5 sessions that attracted the largest audiences:
- the exceptional plenary session "Measuring to invent the future" with nearly 200 people in attendance;
- followed by the "Metrology 4.0" and "Uncertainties and metrological concepts" sessions;
- followed by "New ISO/IEC 17 025" and "Optical measurement flexibility";
- and round-table discussions on "Metrology for the pharmaceutical industry" and "Dynamic measurement and the factory of the future", which led to lively exchanges!
And high-end R&D...
The CIM concluded with a remarkable presentation by Ms. Violaine Sautter, from the Museum National d'Histoire Naturelle, on the work carried out on the instrumentation of the Curiosity rover sent to Mars.
The CIM closing ceremony was also an opportunity to reward two highly technical conferences for the quality of their content and presentation:
- best oral presentation by Henri Foulon, Cesame Exadébit, on "Cryogenic flow measurement using laser Doppler velocimetry",
- the best poster lecture by Timo Donsberg of Aalto University in Finland, "Predictable quantum efficiency detector based on n-type silicon photodiodes".
The Congress brings together all those involved in the measurement sector:
- 64 % are industrialists: users of measuring equipment in all types of sectors, analysis laboratories, metrology laboratories, equipment suppliers or manufacturers... ;
- 23 % are drawn from major national and international bodies: national laboratories in major European countries, government ministries, accreditation bodies, international organizations, etc;
- 10 % academics or researchers ;
- 3 % of participants come from a variety of backgrounds: hospitals, training organizations, consultants, press...
The Collège français de métrologie, organizer of the CIM, would like to warmly thank all the partners who participated in the creation and success of the 2017 edition:
- Organizing Committee members: A3P, Afnor Normalisation, BEA Métrologie, BIPM, COFRAC, EA, Euramet, FPS Economie, LNE, Metro-Logix, NCSL International, NPL, OIML, Peugeot Citroën Automobiles, STIL, Université de Bourgogne, Wika ;
- Sponsors: Trescal main sponsor and Cetiat, Hexagon Manufacturing Intelligence, Implex, and Polyworks;
- institutional support: the Ministry of the Economy and Finance and the DGE, the Ministry of Culture.
Learn more: www.cim2017.com