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There you go... the doors of CIM 2017 have closed!
The International Congress of Metrology (CIM) is a unique place in Europe because it presents all possible technical topics and brings together all the players in the measure: from research and development to industrialists using means of measurement.
It has been organised since 2011 in conjunction with Enova, an electronic technology fair, on-board, IoT, measurement, vision, optics.
The 2017 edition confirmed its place with a very balanced mix between exchanges on good practices measuring the daily lives of industrialists, and presentations of a more futuristic nature linked to the changes of the factory of the future.
The 2017 balance sheet shows a nice stability at the level of the participants and a superb growth of the exhibition part.
The key figures are:
- 840 participants and exhibitors attended the congress (813 in 2015);
- 45 different countries were present, and 30% of the participants came from abroad;
- 78 companies exhibited on the Metrology Village located within the Enova Salon (up 37% compared to 2015!);
- The technical level was rated as excellent or satisfactory by 93% of participants;
- Application opportunities are excellent or satisfactory in 84% of cases;
- 192 lectures were presented in oral or poster sessions.
A remarkable opening by Pascal Faure, Director of the Corporate Directorate of the Ministry of Economy and Finance
Here is an excerpt from this speech: "Today, even more than yesterday, metrology, science and measurement techniques are indispensable success factors of a modern and dynamic industrial policy. (...)
Because each of you knows how crucial measurement control is across the entire value chain: from laboratory research and development to final checks. We have entered an era of innovation at paces never seen before, and this innovation requires ever more efficient and reliable measurement tools. (...)
A unique place in Europe and in the world where questions around metrology can be discussed and where the information necessary for the development of a metrological culture is disseminated: this congress, from my point of view, is an unavoidable event. »
The top 5 sessions that met the widest audience:
- the exceptional plenary session "Measuring to invent the future" with nearly 200 people in the room;
- then the sessions "Metrology 4.0" and "Uncertainties and metrological concepts";
- then the subjects "New ISO/CIS 17 025" and "Flexibility of Optical Measurements";
- and roundtables "Metrology for the Pharmaceutical Industry" and "Dynamic Measurement and Factory of the Future" that have created strong exchanges!
And high-end research and development...
The ICD was concluded by a remarkable intervention by Ms. Violaine Sautter of the National Museum of Natural History, who presented the work carried out on the instrumentation of the Rover Curiosity sent to the planet Mars.
The closing of the ICD was also an opportunity to reward two high-level technical conferences for the quality of their content and presentation:
- the best oral lecture by Henri Foulon, Cesame Exadébit, for the subject "Cryogenic flow measurement by laser doppler velocity",
- the best lecture posted by Timo Donsberg of the University of Aalto in Finland, "Predictive Quantum Performance Detector based on n-type silicon photodiodes."
The Congress brings together all audiences and stakeholders in the measurement sector:
- 64% are industrialists: users of measurement devices in any type of sector, analytical laboratories, metrology laboratories, suppliers or equipment manufacturers...;
- 23% come from major national and international bodies: national laboratory of major European countries, Ministries, accreditation bodies, international organisations...;
- 10% of academics or researchers;
- 3% of participants come from a variety of backgrounds: hospitals, training organizations, consultants, press...
The French College of Metrology, organizer of the CIM, would like to thank warmly all the partners who participated in the creation and success of the 2017 edition:
- members of the Organizing Committee: A3P, Afnor Normalisation, BEA Metrology, BIPM, COFRAC, EA, Euramet, FPS Economy, LNE, Metro-Logix, NCSL International, NPL, OIML, Peugeot Citroen Automobiles, STIL, University of Burgundy, Wika;
- les sponsors: Trescal principal sponsor and Cetiat, hexagon manufacturing intelligence complex and Polyworks;
- institutional support: the Ministry of Economy and Finance and the DGE, the Ministry of Culture.
Find out more: www.cim2017.com
